Atomic layer etching for nano device fabrication

Our way of living today would not be possible without modern electronic devices. Current information and communication technologies, industry, medicine and biotechnology development are made possible by the huge development of semiconductor electronics technology, based on a long-term trend of continuous miniaturization. This ALE-based method of manufacturing nanostructures with a characteristic size below 20 nm, without the use of any advanced nano-patterning, enables nanostructure production in a simple, economical and smart way, as it relies only on changes in processing steps and processing parameters.